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Proceedings Paper

Polarization aberration analysis using Pauli-Zernike representation
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Paper Abstract

Polarized illumination is a viable technique for improving the image quality and process latitude of hyper-NA lithography. On investigation of polarization effects, it is often assumed that the lens system can maintain the polarization state through optical path, which may not be the case with actual lenses. These polarization changes may cause CD variations and pattern placement errors. In this paper, we investigated a method of polarization analysis across the pupil and showed some examples of polarization aberrations. Also, we analyzed CD sensitivity and pattern placement errors from polarization aberrations. Specific terms of the Pauli Zernike representation have effects on CD and pattern placement errors, like the Zernike representation of conventional aberrations. The Pauli-Zernike representation is intuitive and useful for understanding and specifying polarization aberrations.

Paper Details

Date Published: 26 March 2007
PDF: 12 pages
Proc. SPIE 6520, Optical Microlithography XX, 65200Y (26 March 2007); doi: 10.1117/12.711336
Show Author Affiliations
Norihiro Yamamoto, Spansion Japan Ltd. (Japan)
Jongwook Kye, Advanced Micro Devices, Inc. (United States)
Harry J. Levinson, Advanced Micro Devices, Inc. (United States)

Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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