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Proceedings Paper

Development of EUV mask handling technology at MIRAI-Selete
Author(s): Kazuya Ota; Mitsuaki Amemiya; Takao Taguchi; Takashi Kamono; Hiroyoshi Kubo; Tadahiko Takikawa; Yoichi Usui; Osamu Suga
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Paper Abstract

We, MIRAI-Selete, started a new EUV mask program in April, 2006. Development of EUV mask handling technology is one of the key areas of the program. We plan to develop mask handling technology and to evaluate EUV mask carriers using Lasertec M3350, a particle inspection tool with the defect sensitivity less than 50nm PSL, and Mask Protection Engineering Tool (named "MPE Tool"). M3350 is a newly developed tool based on a conventional M1350 for EUV blanks inspection. Since our M3350 has a blank flipping mechanism in it, we can inspect the front and the back surface of the blank automatically. We plan to use the M3350 for evaluating particle adders during mask shipping, storage and handling. MPE Tool is a special tool exclusively developed for demonstration of pellicleless mask handling. It can handle a mask within a protective enclosure, which Canon and Nikon have been jointly proposing1, and also, can be modified to handle other type of carrier as the need arises.

Paper Details

Date Published: 20 March 2007
PDF: 7 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171Z (20 March 2007); doi: 10.1117/12.711317
Show Author Affiliations
Kazuya Ota, Semiconductor Leading Edge Technologies, Inc. (Japan)
Mitsuaki Amemiya, Semiconductor Leading Edge Technologies, Inc. (Japan)
Takao Taguchi, Semiconductor Leading Edge Technologies, Inc. (Japan)
Takashi Kamono, Semiconductor Leading Edge Technologies, Inc. (Japan)
Hiroyoshi Kubo, Semiconductor Leading Edge Technologies, Inc. (Japan)
Tadahiko Takikawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Yoichi Usui, Semiconductor Leading Edge Technologies, Inc. (Japan)
Osamu Suga, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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