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Proceedings Paper

BARC (bottom anti-reflective coating) for immersion process
Author(s): Yoshiomi Hiroi; Takahiro Kishioka; Rikimaru Sakamoto; Daisuke Maruyama; Takuya Ohashi; Tomohisa Ishida; Shigeo Kimura; Yasushi Sakaida; Hisayuki Watanabe
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Paper Abstract

193nm immersion Lithography will be installed at 45nm and beyond. For severe CD control, BARC (Bottom Antireflective Coating) has been used and this material must be used for immersion lithography. So far, we have developed several BARCs with various advantages (fast etch rate, broad resist compatibility, high adhesion, conformal...etc). Especially in an immersion process, development of BARC has to satisfy for the optical control and defectivity. The reflectivity control at Hyper NA is not same as the lower NA, because optical pass length in the BARC is not the same between low NA and High NA. In order to achieve enough etch selectivity to the substrate, hard mask materials are necessary. These under layers have absorption at 193nm. As a result of simulation, target optical parameters of next BARC should be low k value (k = ~0.25) for multi BARC stack. On the other hand, the defect issue must be decreased in the immersion process. However, the generation of many kinds of defects is suspected in the immersion process (water mark, blob defect, sublimation defect...etc). Regarding the BARC, there are also several specific defects in this process. Especially, after edge bead rinse, film peeling at edge area is one of the concerns. We researched the root cause of edge peeling and a solution for this defect. In this paper, we will discuss the detail of our BARC approach for litho performance, optical parameter, leaching, sublimation, edge peel defects and etch selectivity, and introduce new BARC for 193nm immersion lithography.

Paper Details

Date Published: 4 April 2007
PDF: 10 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651928 (4 April 2007); doi: 10.1117/12.711305
Show Author Affiliations
Yoshiomi Hiroi, Nissan Chemical Industries, Ltd. (Japan)
Takahiro Kishioka, Nissan Chemical Industries, Ltd. (Japan)
Rikimaru Sakamoto, Nissan Chemical Industries, Ltd. (Japan)
Daisuke Maruyama, Nissan Chemical Industries, Ltd. (Japan)
Takuya Ohashi, Nissan Chemical Industries, Ltd. (Japan)
Tomohisa Ishida, Nissan Chemical Industries, Ltd. (Japan)
Shigeo Kimura, Nissan Chemical Industries, Ltd. (Japan)
Yasushi Sakaida, Nissan Chemical Industries, Ltd. (Japan)
Hisayuki Watanabe, Nissan Chemical Industries, Ltd. (Japan)

Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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