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Proceedings Paper

Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography
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Paper Abstract

Reliable high power 193nm ArF light source is desired for the successive growth of ArF-immersion technology for 45nm node generation. In 2006, Gigaphoton released GT60A, high power injection locked 6kHz/60W/0.5pm (E95) laser system, to meet the demands of semiconductor markets. In this paper, we report key technologies for reliable mass production GT laser systems and GT60A high durability performance test results up to 20 billion pulses.

Paper Details

Date Published: 27 March 2007
PDF: 7 pages
Proc. SPIE 6520, Optical Microlithography XX, 652031 (27 March 2007); doi: 10.1117/12.711258
Show Author Affiliations
Hidenori Watanabe, Gigaphoton Inc. (Japan)
Shigeo Komae, Gigaphoton Inc. (Japan)
Satoshi Tanaka, Ushio Inc. (Japan)
Ryoichi Nohdomi, Gigaphoton Inc. (Japan)
Taku Yamazaki, Gigaphoton Inc. (Japan)
Hiroaki Nakarai, Gigaphoton Inc. (Japan)
Junichi Fujimoto, Gigaphoton Inc. (Japan)
Takashi Matsunaga, Komatsu Ltd. (Japan)
Takashi Saito, Gigaphoton inc. (Japan)
Kouji Kakizaki, Ushio Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)


Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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