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Proceedings Paper

Current status of high-index immersion lithography development
Author(s): Yasuhiro Ohmura; Toshiharu Nakashima; Hiroyuki Nagasaka; Ayako Sukegawa; Satoshi Ishiyama; Koichi Kamijo; Masahiko Shinkai; Soichi Owa
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Paper Abstract

High index immersion lithography (HIL) is one candidate for the next generation lithography technology following water immersion lithography. This technology may require only moderate changes of chip making processes and result in lower cost of ownership (CoO) compared with other technologies such as double processing, extreme ultra violet lithography (EUVL), and nano-imprinting, and other technologies. In this paper, the current status of high index lens material and immersion fluid development compared with our requirements is discussed considering microlithographic lens design feasibility and attainable NA.

Paper Details

Date Published: 26 March 2007
PDF: 9 pages
Proc. SPIE 6520, Optical Microlithography XX, 652006 (26 March 2007); doi: 10.1117/12.711252
Show Author Affiliations
Yasuhiro Ohmura, Nikon Corp. (Japan)
Toshiharu Nakashima, Nikon Corp. (Japan)
Hiroyuki Nagasaka, Nikon Corp. (Japan)
Ayako Sukegawa, Nikon Corp. (Japan)
Satoshi Ishiyama, Nikon Corp. (Japan)
Koichi Kamijo, Nikon Corp. (Japan)
Masahiko Shinkai, Nikon Corp. (Japan)
Soichi Owa, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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