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Proceedings Paper

Algorithm for lithography advanced process control system for high-mix low-volume products
Author(s): Eiichi Kawamura
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Paper Abstract

We have proposed a new algorithm of Lithography Advanced Process Control System for high-mix low-volume production. This algorithm works well for 1st lot of a new device input into the production line, or 1st lot of an existing device to be exposed with a newly introduced exposure tool. The algorithm consists of 1) searching the most suitable trend of other similar devices referring to an attribute table and a look-up table for priority of searching order, and 2) correction of differences between the two devices for deciding optimum exposure conditions. The attribute table categorizes same layers across different devices and similar layers within a device. Look-up table describes the order of searching keys. To attain cost-effective process control system, information useful to compensate referred trend is compiled into the database.

Paper Details

Date Published: 5 April 2007
PDF: 8 pages
Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651820 (5 April 2007); doi: 10.1117/12.711244
Show Author Affiliations
Eiichi Kawamura, Fujitsu, Ltd. (Japan)


Published in SPIE Proceedings Vol. 6518:
Metrology, Inspection, and Process Control for Microlithography XXI
Chas N. Archie, Editor(s)

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