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Proceedings Paper

Small field exposure tool (SFET) light source
Author(s): Tamotsu Abe; Takashi Suganuma; Masato Moriya; Takayuki Yabu; Takeshi Asayama; Hiroshi Someya; Yoshifumi Ueno; Georg Soumagne; Akira Sumitani; Hakaru Mizoguchi
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Paper Abstract

A laser produced plasma light source for a small field exposure tool (SFET) has been developed at the EUVA Hiratsuka R&D center. The light source consists of the following components: The drive laser of the xenon plasma source is a short-pulse, high-power KrF laser that has been developed in cooperation with Gigaphoton Inc. and Komatsu Ltd. The laser has an unstable resonator and produces a maximum output power of 580W at 4kHz repetition rate. The xenon target is a 50 micrometer diameter liquid jet with a speed of about 35 m/s. The source has been designed to generate 0.5W in-band power at the intermediate focus (IF) at a collecting solid angle of pi sr. The source includes automatic control, e.g. jet and plasma position control, and an electrical interface for the exposure tool. The performance of the source at IF has been evaluated by Canon Inc. This paper explains source performances. Especially, results of IF parameters like image size, position stability and out of band radiation are presented.

Paper Details

Date Published: 21 March 2007
PDF: 8 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65173C (21 March 2007); doi: 10.1117/12.711241
Show Author Affiliations
Tamotsu Abe, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Suganuma, Extreme Ultraviolet Lithography System Development Association (Japan)
Masato Moriya, Extreme Ultraviolet Lithography System Development Association (Japan)
Takayuki Yabu, Extreme Ultraviolet Lithography System Development Association (Japan)
Takeshi Asayama, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Someya, Extreme Ultraviolet Lithography System Development Association (Japan)
Yoshifumi Ueno, Extreme Ultraviolet Lithography System Development Association (Japan)
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Sumitani, Extreme Ultraviolet Lithography System Development Association (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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