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Proceedings Paper

Characterization of various Sn targets with respect to debris and fast ion generation
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Paper Abstract

We evaluated Sn debris generated from a CO2 laser (10.um) and a Nd:YAG laser (1064nm) plasma. Experiments were performed with bulk Sn-plates (t=1mm) and freestanding Sn-foils (t=15um). Quartz Crystal Microbalances (QCM) were used for debris analysis. We observed a drastically lower deposition for the CO2 laser driven plasma compared with the Nd:YAG laser plasma. In addition, several Sn coated targets with different Sn thickness were investigated for the CO2 drive laser with respect to the generated plasma debris. In general, a 100nm Sn coated glass target generated more debris than the solid Sn target. Especially, we observed for the Sn-plate target that the deposition rate is smaller than the erosion (sputter) rate caused by the plasma ions.

Paper Details

Date Published: 21 March 2007
PDF: 10 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65173B (21 March 2007); doi: 10.1117/12.711226
Show Author Affiliations
Yoshifumi Ueno, Extreme Ultraviolet Lithography System Development Association (Japan)
Hideo Hoshino, Extreme Ultraviolet Lithography System Development Association (Japan)
Tatsuya Ariga, Extreme Ultraviolet Lithography System Development Association (Japan)
Taisuke Miura, Extreme Ultraviolet Lithography System Development Association (Japan)
Masaki Nakano, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Komori, Extreme Ultraviolet Lithography System Development Association (Japan)
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Endo, Extreme Ultraviolet Lithography System Development Association (Japan)
Hakaru Mizoguchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Sumitani, Extreme Ultraviolet Lithography System Development Association (Japan)
Koichi Toyoda, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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