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Proceedings Paper

Laser produced EUV light source development for HVM
Author(s): Akira Endo; Hideo Hoshino; Takashi Suganuma; Masato Moriya; Tatsuya Ariga; Yoshifumi Ueno; Masaki Nakano; Takeshi Asayama; Tamotsu Abe; Hiroshi Komori; Georg Soumagne; Hakaru Mizoguchi; Akira Sumitani; Koichi Toyoda
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Paper Abstract

We develop a laser produced plasma light source for high volume manufacturing (HVM) EUV lithography. The light source is based on a short pulse, high power, high repetition rate CO2 master oscillator power amplifier (MOPA) laser system and a Tin droplet target. A maximum conversion efficiency of 4.5% was measured for a CO2 laser driven Sn plasma having a narrow spectrum at 13.5 nm. In addition, low debris generation was observed. The CO2 MOPA laser system is based on commercial high power cw CO2 lasers. We achieve an average laser power of 3 kW at 100 kHz with a single laser beam that has very good beam quality. In a first step, a 50-W light source is developing. Based on a 10-kW CO2 laser this light source is scalable to more than 100 W EUV in-band power.

Paper Details

Date Published: 19 March 2007
PDF: 8 pages
Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65170O (19 March 2007); doi: 10.1117/12.711097
Show Author Affiliations
Akira Endo, Extreme Ultraviolet Lithography System Development Association (Japan)
Hideo Hoshino, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Suganuma, Extreme Ultraviolet Lithography System Development Association (Japan)
Masato Moriya, Extreme Ultraviolet Lithography System Development Association (Japan)
Tatsuya Ariga, Extreme Ultraviolet Lithography System Development Association (Japan)
Yoshifumi Ueno, Extreme Ultraviolet Lithography System Development Association (Japan)
Masaki Nakano, Extreme Ultraviolet Lithography System Development Association (Japan)
Takeshi Asayama, Extreme Ultraviolet Lithography System Development Association (Japan)
Tamotsu Abe, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Komori, Extreme Ultraviolet Lithography System Development Association (Japan)
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Hakaru Mizoguchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Sumitani, Extreme Ultraviolet Lithography System Development Association (Japan)
Koichi Toyoda, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 6517:
Emerging Lithographic Technologies XI
Michael J. Lercel, Editor(s)

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