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Proceedings Paper

High-index fluoride materials for 193-nm immersion lithography
Author(s): Teruhiko Nawata; Yoji Inui; Isao Masada; Eiichi Nishijima; Toshiro Mabuchi; Naoto Mochizuki; Hiroki Satoh; Tsuguo Fukuda
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Paper Abstract

BaLiF3 single crystal has been studied as the lens material for the candidate of the next generation high index immersion lithography system. Although the refractive index of BaLiF3 is 1.64 at 193nm which is not sufficient for the requirement, other optical properties such as 193nm transparency and laser durability might fulfill the requirement, and intrinsic birefringence is relatively lower than other candidate materials. It is estimated that the cause of scattering in the BaLiF3 crystal is aggregation of excess LiF component. The special annealing process to eliminate excess LiF component was applied to improve the transparency. The internal transparency was improved to more than 97%/cm by optimizing growth conditions and annealing conditions.

Paper Details

Date Published: 27 March 2007
PDF: 9 pages
Proc. SPIE 6520, Optical Microlithography XX, 65201P (27 March 2007); doi: 10.1117/12.711045
Show Author Affiliations
Teruhiko Nawata, Tokuyama Corp. (Japan)
Yoji Inui, Tokuyama Corp. (Japan)
Isao Masada, Tokuyama Corp. (Japan)
Eiichi Nishijima, Tokuyama Corp. (Japan)
Toshiro Mabuchi, Tokuyama Corp. (Japan)
Naoto Mochizuki, Tokuyama Corp. (Japan)
Hiroki Satoh, Tohoku Univ. (Japan)
Tsuguo Fukuda, Tohoku Univ. (Japan)


Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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