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Proceedings Paper

Challenges and solutions for transferring a 248-nm process to 365-nm imaging
Author(s): Alexander Serebriakov; Chicheng Chang; Arthur Becht; Rene Pluijms; Anthony Cheng; Elly Shi; Han van den Broek; Li Zhao
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Paper Abstract

In order to minimize manufacturing costs, lithographers have to extend the capabilities of KrF and i-line tools working with low k1 factor. In this paper we present results of a successful transfer of several lithographic processes from KrF to i-line. During the process transfer, the optimal conditions for 365-nm technology were first determined by simulation and then verified by exposure of real production layers on a 0.65 NA i-line tool. The goal of the process optimization was to find settings for 365-nm process, which can match the performance of the 248-nm process. Proximity matching, CD uniformity, tool throughput and process costs were chosen as the main criteria for successful transfer. Encountered challenges, the applied methodology and the experimental results have been discussed. Based on the results, we conclude that low k1 i-line lithography is feasible for mass production with CD as small as 210 nm. The process does not require additional preparation for 248-nm masks.

Paper Details

Date Published: 27 March 2007
PDF: 9 pages
Proc. SPIE 6520, Optical Microlithography XX, 65204L (27 March 2007); doi: 10.1117/12.710856
Show Author Affiliations
Alexander Serebriakov, ASML Netherlands B.V. (Netherlands)
Chicheng Chang, SMIC (China)
Arthur Becht, ASML Netherlands B.V. (Netherlands)
Rene Pluijms, ASML Netherlands B.V. (Netherlands)
Anthony Cheng, ASML Netherlands B.V. (Netherlands)
Elly Shi, ASML Netherlands B.V. (Netherlands)
Han van den Broek, ASML Netherlands B.V. (Netherlands)
Li Zhao, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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