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Proceedings Paper

Organic ArF bottom anti-reflective coatings for immersion lithography
Author(s): Zhong Xiang; Hong Zhuang; Hengpeng Wu; Jianhui Shan; Dave Abdallah; Jian Yin; Salem Mullen; Huirong Yao; Eleazar Gonzalez; Mark Neisser
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Paper Abstract

Substrate reflectivity control plays an important role in immersion lithography. Multilayer bottom anti-reflective coatings (B.A.R.C.s) become necessary. This paper will focus on the recent development in organic ArF B.A.R.C. for immersion lithography. Single layer low k ArF B.A.R.C.s in conjunction with multilayer CVD hard mask and dual layer organic ArF B.A.R.C. application will be discussed. High NA dry and wet lithography data will be presented. We will also present the etch rate data, defect data and out-gassing property of these new B.A.R.C. materials.

Paper Details

Date Published: 6 April 2007
PDF: 10 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651929 (6 April 2007); doi: 10.1117/12.710669
Show Author Affiliations
Zhong Xiang, AZ Electronic Materials USA Corp. (United States)
Hong Zhuang, AZ Electronic Materials USA Corp. (United States)
Hengpeng Wu, AZ Electronic Materials USA Corp. (United States)
Jianhui Shan, AZ Electronic Materials USA Corp. (United States)
Dave Abdallah, AZ Electronic Materials USA Corp. (United States)
Jian Yin, AZ Electronic Materials USA Corp. (United States)
Salem Mullen, AZ Electronic Materials USA Corp. (United States)
Huirong Yao, AZ Electronic Materials USA Corp. (United States)
Eleazar Gonzalez, AZ Electronic Materials USA Corp. (United States)
Mark Neisser, AZ Electronic Materials USA Corp. (United States)


Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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