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Proceedings Paper

Modeling resist response in holographic formation of three-dimension photonic crystal templates
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Paper Abstract

A comprehensive model of holographic lithography is used to predict the final structure of a phasemask-formed photonic crystal in SU-8 photoresist. It includes optical imperfections in the phase mask, beam attenuation in the resist, and resist reaction kinetics such as acid diffusion, resist shrinkage and developer diffusion. By comparing simulations with the laser-formed PC templates in our lab, we can identify the origin of various crystal lattice distortions, and more accurately predict the template geometry and crystal motif.

Paper Details

Date Published: 8 September 2006
PDF: 8 pages
Proc. SPIE 6343, Photonics North 2006, 63432Y (8 September 2006); doi: 10.1117/12.710618
Show Author Affiliations
Ladan E. Abolghasemi, Univ. of Toronto (Canada)
Debashis Chanda, Univ. of Toronto (Canada)
Peter R. Herman, Univ. of Toronto (Canada)


Published in SPIE Proceedings Vol. 6343:
Photonics North 2006
Pierre Mathieu, Editor(s)

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