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Proceedings Paper

Dr.LiTHO: a development and research lithography simulator
Author(s): Tim Fühner; Thomas Schnattinger; Gheorghe Ardelean; Andreas Erdmann
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Paper Abstract

This paper introduces Dr.LiTHO, a research and development oriented lithography simulation environment developed at Fraunhofer IISB to flexibly integrate our simulation models into one coherent platform. We propose a light-weight approach to a lithography simulation environment: The use of a scripting (batch) language as an integration platform. Out of the great variety of different scripting languages, Python proved superior in many ways: It exhibits a good-natured learning-curve, it is efficient, available on virtually any platform, and provides sophisticated integration mechanisms for existing programs. In this paper, we will describe the steps, required to provide Python bindings for existing programs and to finally generate an integrated simulation environment. In addition, we will give a short introduction into selected software design demands associated with the development of such a framework. We will especially focus on testing and (both technical and user-oriented) documentation issues. Dr.LiTHO Python files contain not only all simulation parameter settings but also the simulation flow, providing maximum flexibility. In addition to relatively simple batch jobs, repetitive tasks can be pooled in libraries. And as Python is a full-blown programming language, users can add virtually any functionality, which is especially useful in the scope of simulation studies or optimization tasks, that often require masses of evaluations. Furthermore, we will give a short overview of the numerous existing Python packages. Several examples demonstrate the feasibility and productiveness of integrating Python packages into custom Dr.LiTHO scripts.

Paper Details

Date Published: 27 March 2007
PDF: 12 pages
Proc. SPIE 6520, Optical Microlithography XX, 65203F (27 March 2007); doi: 10.1117/12.709535
Show Author Affiliations
Tim Fühner, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Thomas Schnattinger, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Gheorghe Ardelean, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Andreas Erdmann, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)

Published in SPIE Proceedings Vol. 6520:
Optical Microlithography XX
Donis G. Flagello, Editor(s)

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