Share Email Print
cover

Proceedings Paper

CMOS integrable micromirrors with highly improved drift-stability
Author(s): Jan U. Schmidt; Jens Knobbe; Andreas Gehner; Hubert Lakner
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The large-scale integration of analog operable MEMS micro-mirrors onto active CMOS address circuitry requires high quality planar reflective optical surfaces but also a stable deflection vs. voltage characteristic. However, for implementing a CMOS compatible surface micromachining process, certain obstacles like a restricted thermal budget and a limited selection of suitable materials must be overcome. In this paper, amorphous TiAl is presented as a new actuator material for monolithical MEMS integration onto CMOS circuitry at room temperature. Sputter deposited TiAl has an x-ray amorphous structure and a low stress gradient. The missing long range order and the high melting point help to virtually eliminate stress relaxation effects, i.e. TiAl hinges behave almost perfectly elastic. In a first study, 40 &mgr;m wide piston mirrors have been implemented onto substrates with fixed wired address electrode arrays. The actuators had a 300 nm TiAl core sandwiched between two layers of 25 nm Al. The devices reach a maximum deflection of about 500 nm at a dc voltage of about 23V. The drift-stability of the deflection has been tested at "worst case" conditions close to the deflection limit. During 30 min of continuous deflection near 500 nm a mechanical drift below 25nm has been observed. TiAl offers the perspective for actuators capable of a stable analog operation, which is essential to many applications, such as adaptive optics.

Paper Details

Date Published: 9 February 2007
PDF: 11 pages
Proc. SPIE 6467, MEMS Adaptive Optics, 64670R (9 February 2007); doi: 10.1117/12.707630
Show Author Affiliations
Jan U. Schmidt, Fraunhofer Institute of Photonic Microsystems (Germany)
Jens Knobbe, Fraunhofer Institute of Photonic Microsystems (Germany)
Andreas Gehner, Fraunhofer Institute of Photonic Microsystems (Germany)
Hubert Lakner, Fraunhofer Institute of Photonic Microsystems (Germany)


Published in SPIE Proceedings Vol. 6467:
MEMS Adaptive Optics
Scot S. Olivier; Thomas G. Bifano; Joel A. Kubby, Editor(s)

© SPIE. Terms of Use
Back to Top