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Proceedings Paper

Tailoring surface properties of ArF resists thin films with functionally graded materials (FGM)
Author(s): Ichiki Takemoto; Nobuo Ando; Kunishige Edamatsu; Yusuke Fuji; Koji Kuwana; Kazuhiko Hashimoto; Junji Funase; Hiroyuki Yokoyama
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Paper Abstract

Our recent research effort has been focused on new top coating-free 193nm immersion resists with regard to leaching of the resist components and lithographic performance. We have examined methacrylate-based resins that control the surface properties of ArF resists thin films by surface segregation behavior. For a better understanding of the surface properties of thin films, we prepared the six resins (Resin 1-6) that have three types fluorine containing monomers, a new monomer (Monomer A), Monomer B and Monomer C, respectively. We blended the base polymer (Resin 0) with Resin (1-6), respectively. We evaluated contact angles, surface properties and lithographic performances of the polymer blend resists. The static and receding contact angles of the resist that contains Resin (1-6) are greater than that of the base polymer (Resin 0) resist. The chemical composition of the surface of blend polymers was investigated with X-ray photoelectron spectroscopy (XPS). It was shown that there was significant segregation of the fluorine containing resins to the surface of the blend films. We analyzed Quantitative Structure-Property Relationships (QSPR) between the surface properties and the chemical composition of the surface of polymer blend resists. The addition of 10 wt% of the polymer (Resin 1-6) to the base polymer (Resin 0) did not influence the lithographic performance. Consequently, the surface properties of resist thin films can be tailored by the appropriate choice of fluorine containing polymer blends.

Paper Details

Date Published: 3 April 2007
PDF: 9 pages
Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 65191X (3 April 2007); doi: 10.1117/12.707525
Show Author Affiliations
Ichiki Takemoto, Sumitomo Chemical Co., Ltd. (Japan)
Nobuo Ando, Sumitomo Chemical Co., Ltd. (Japan)
Kunishige Edamatsu, Sumitomo Chemical Co., Ltd. (Japan)
Yusuke Fuji, Sumitomo Chemical Co., Ltd. (Japan)
Koji Kuwana, Sumitomo Chemical Co., Ltd. (Japan)
Kazuhiko Hashimoto, Sumitomo Chemical Co., Ltd. (Japan)
Junji Funase, Sumitomo Chemical Co., Ltd. (Japan)
Hiroyuki Yokoyama, Sumitomo Chemical Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 6519:
Advances in Resist Materials and Processing Technology XXIV
Qinghuang Lin, Editor(s)

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