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Proceedings Paper

Micromachined silicon grids for direct TEM and Raman characterization of CVD grown carbon nanotubes
Author(s): Yongho Choi; Ant Ural
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Paper Abstract

Transmission electron microscopy (TEM) and micro-Raman spectroscopy are key techniques in the structural characterization of carbon nanotubes. For device applications, carbon nanotubes are typically grown by chemical vapor deposition (CVD) on silicon substrates. However, TEM requires very thin samples, which are electron transparent. Therefore, for TEM analysis, CVD grown nanotubes are typically deposited on commercial TEM grids by post-processing. This procedure has two problems: It can damage the nanotubes, and it does not work reliably if the nanotube density is too low. The ability to do TEM directly on as-grown nanotubes lying on the silicon substrate would solve these two problems. In this talk, for this purpose, we fabricate micromachined TEM grids from silicon substrates. Subsequently, we grow nanotubes on these micromachined TEM grids by CVD, and characterize the nanotubes by TEM, micro-Raman spectroscopy, scanning electron microscopy (SEM), and atomic force microscopy (AFM). We show that these substrates provide a low cost, mass producible, efficient, and reliable platform for direct TEM, Raman, AFM, and SEM analysis of as-grown nanotubes or other nanomaterials on the same substrate, eliminating the need for any post-processing after CVD growth.

Paper Details

Date Published: 12 February 2007
PDF: 5 pages
Proc. SPIE 6464, MEMS/MOEMS Components and Their Applications IV, 64640A (12 February 2007); doi: 10.1117/12.707522
Show Author Affiliations
Yongho Choi, Univ. of Florida (United States)
Ant Ural, Univ. of Florida (United States)


Published in SPIE Proceedings Vol. 6464:
MEMS/MOEMS Components and Their Applications IV
Srinivas A. Tadigadapa; Reza Ghodssi; Albert K. Henning, Editor(s)

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