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Proceedings Paper

Fabrication and characterization of ZnO nanorods by pulsed laser deposition method through catalyst-free process
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Paper Abstract

The ZnO nanorod possesses large surface area, high aspect ratio and quantum confinement effect. Therefore, the ZnO nanorod would be a candidate for a gas sensor, dye-sensitized solar cell, etc. For device applications, it is very important to control the growth of ZnO nanorods. Pulsed-laser deposition (PLD) is an effective method to grow ZnO nanostructures. In this paper, we have fabricated the ZnO nanorods on Si substrate through a two-step process without a metal catalyst. As for a first step, ZnO powder dispersed on Si substrate is thermally annealed in order to fabricate ZnO seed layer. The seed acts as a catalyst of the ZnO nanorod growth, and is found to be zinc silicate (112) by XRD measurement. Secondly, ZnO is deposited on the seed layer by PLD at an argon pressure of 10-2 Torr. The length of nanorods is up to 4 μm with a typical diameter of 100 nm. The CL emission spectra are observed and the existence of defects within the ZnO nanorods has been identified. By controlling the growth parameters, high-quality nanorods without defects were fabricated by this two-step PLD method.

Paper Details

Date Published: 13 March 2007
PDF: 8 pages
Proc. SPIE 6458, Photon Processing in Microelectronics and Photonics VI, 645817 (13 March 2007); doi: 10.1117/12.706278
Show Author Affiliations
Ryo Nishimura, Keio Univ. (Japan)
Tatsunori Sakano, Keio Univ. (Japan)
Takeshi Okato, Keio Univ. (Japan)
Minoru Obara, Keio Univ. (Japan)


Published in SPIE Proceedings Vol. 6458:
Photon Processing in Microelectronics and Photonics VI
David B. Geohegan; Craig B. Arnold; Tatsuo Okada; Frank Träger; Jan J. Dubowski; Michel Meunier; Andrew S. Holmes, Editor(s)

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