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Proceedings Paper

Advanced waveguide lasers fabricated by femtosecond laser writing in an Er:Yb-doped phosphate glass
Author(s): Giuseppe Della Valle; Roberto Osellame; Stefano Taccheo; Nicola Chiodo; Gianluca Galzerano; Giulio Cerullo; Paolo Laporta; Roberta Ramponi; Uwe Morgner; Aleksey G. Rozhin; Vittorio Scardaci; Andrea C. Ferrari
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Paper Abstract

Recently, great effort has been devoted to waveguide lasers, because of their inherent simplicity with respect to fiber lasers. Actually, due to their compactness, such lasers are expected to achieve a higher temporal coherence, making them attracting for fiber optical reflectometry, distribute sensing, and range finding applications. Furthermore, the availablity of fast saturable absorbers based on carbon nanotubes allows for a cheap and reliable implementation of the passive mode-locking technique with the potential for generating high repetition rate pulse trains. Such lasers will provide low-noise and inexpensive pulsed sources for applications in optical communications, optically sampled analog-to-digital converters, and spectral line-by-line pulse shaping. We report here on advanced waveguide lasers, operating both in continuous wave and pulsed regimes, based on active waveguides fabricated by femtosecond laser writing in a phosphate glass substrate. A single longitudinal mode waveguide laser providing more than 50 mW with 21% slope efficiency was demonstrated. Furthermore, by combining a high gain waveguide and an innovated fiber-pigtailed saturable absorber based on carbon nanotubes, a mode-locked ring laser providing transform limited 1.6-ps pulses was also demonstrated.

Paper Details

Date Published: 20 February 2007
PDF: 9 pages
Proc. SPIE 6469, Optical Components and Materials IV, 64690J (20 February 2007); doi: 10.1117/12.700458
Show Author Affiliations
Giuseppe Della Valle, Istituto di Fotonica e Nanotecnologie, CNR, Politecnico di Milano (Italy)
Roberto Osellame, Istituto di Fotonica e Nanotecnologie, CNR, Politecnico di Milano (Italy)
Stefano Taccheo, Istituto di Fotonica e Nanotecnologie, CNR, Politecnico di Milano (Italy)
Nicola Chiodo, Istituto di Fotonica e Nanotecnologie, CNR, Politecnico di Milano (Italy)
Gianluca Galzerano, Istituto di Fotonica e Nanotecnologie, CNR, Politecnico di Milano (Italy)
Giulio Cerullo, Istituto di Fotonica e Nanotecnologie, CNR, Politecnico di Milano (Italy)
Paolo Laporta, Istituto di Fotonica e Nanotecnologie, CNR, Politecnico di Milano (Italy)
Roberta Ramponi, Istituto di Fotonica e Nanotecnologie, CNR, Politecnico di Milano (Italy)
Uwe Morgner, Univ. of Hannover (Germany)
Aleksey G. Rozhin, Cambridge Univ. (United Kingdom)
Vittorio Scardaci, Cambridge Univ. (United Kingdom)
Andrea C. Ferrari, Cambridge Univ. (United Kingdom)


Published in SPIE Proceedings Vol. 6469:
Optical Components and Materials IV
Shibin Jiang; Michel J. F. Digonnet, Editor(s)

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