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Proceedings Paper

Fabrication and characterization of zinc oxide based rib waveguide
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Paper Abstract

In this work we investigate the possibility to use Zinc Oxide (ZnO) thin films, deposited by RF magnetron sputtering, for the realization of integrated optical structures working at 1550 nm. Structural properties of sputtered zinc oxide thin films were studied by means of X-ray Diffraction (XRD) measurements, while optical properties were investigated by spectrophotometry and Spectroscopic Ellipsometry (SE). In particular, ellipsometric measurements allowed to determine the dispersion law of the ZnO complex refractive index (see manuscript) = n - jk through the multilayer modeling using Tauc-Lorentz (TL) dispersion model. We have found a preferential c-axis growth of ZnO films, with slightly variable deposition rates from 2.5 to 3.8 Å/s. Conversely, the refractive index exhibits, from UV to near IR, a considerable and almost linear variation when the oxygen flux value in the deposition chamber varies from 0 to 10 sccm. In order to realize a waveguide structure, a 3-&mgr;m-thick ZnO film was deposited onto silicon single crystal substrates, where a 0.5-&mgr;m-thick thermal SiO2 buffer layer was previously realized, acting as lower cladding. Dry and wet chemical etching processes have been investigated to achieve controllable etching rate and step etching profile, with the aim to realize an optical rib waveguide. The etched surfaces were inspected using scanning electron microscopy (SEM) and optical microscopy. Moreover, we carried out the experimental measurements of the fringes pattern and Free Spectral Range (FSR) of an integrated Fabry- Perot etalon, obtained by cleaving of a single mode rib waveguide.

Paper Details

Date Published: 20 February 2007
PDF: 9 pages
Proc. SPIE 6474, Zinc Oxide Materials and Devices II, 64741H (20 February 2007); doi: 10.1117/12.700299
Show Author Affiliations
M. Gioffrè, Istituto per la Microelettronica e Microsistemi, CNR (Italy)
M. Gagliardi, Univ. Mediterranea di Reggio Calabria (Italy)
M. Casalino, Univ. Mediterranea di Reggio Calabria (Italy)
G. Coppola, Istituto per la Microelettronica e Microsistemi, CNR (Italy)
M. Iodice, Istituto per la Microelettronica e Microsistemi, CNR (Italy)
F. Della Corte, Univ. Mediterranea di Reggio Calabria (Italy)


Published in SPIE Proceedings Vol. 6474:
Zinc Oxide Materials and Devices II
Ferechteh Hosseini Teherani; Cole W. Litton, Editor(s)

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