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Proceedings Paper

Implementation of far-field phase-shift lithography using diffractive optical elements
Author(s): Wei-Feng Hsu; Yuan-Hong Su
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Paper Abstract

We proposed a method, which is the first to our knowledge, to realize the phase-shift patterns of the near-field lithography in the optical far field. The key component of the optical Fourier system was a phase-only diffractive optical element which generated a diffracted light field of a semi-phase-only complex-valued function. The achieved feature size was beyond the diffraction limit. The advantages of the proposed method included the capability to generate the complicated patterns, spatial parallelism, and low cost.

Paper Details

Date Published: 7 March 2007
PDF: 8 pages
Proc. SPIE 6462, Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII, 64621C (7 March 2007); doi: 10.1117/12.699950
Show Author Affiliations
Wei-Feng Hsu, National Taipei Univ. of Technology (Taiwan)
Yuan-Hong Su, National Taipei Univ. of Technology (Taiwan)


Published in SPIE Proceedings Vol. 6462:
Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII
Mary-Ann Maher; Thomas J. Suleski; Eric G. Johnson; Harold D. Stewart; Jung-Chih Chiao; Gregory P. Nordin, Editor(s)

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