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Proceedings Paper

Characterization of light scattering and film structure of TiO2 thin film
Author(s): H. Murotani; T. Kudo; M. Wakaki
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Paper Abstract

The structure of optical thin films changes depending on various parameters. Typical these parameters are materials, coating methods and coating parameters (for example, assisted ion beam power etc.). For example, titanium dioxide thin films prepared by IAD (Ion Assisted Deposition) method take the column structure. Foggy levels of the deposited film depend on the film structure. Recently, the foggy levels are measured using a haze meter. But weak foggy sample with small haze value does not correspond to visual inspection. In this work, optical thin films were characterized by not only the intensity of the scattered light but also wavelength parameter. As a result, it was found that the estimation of the structure of optical thin films was possible by using the wavelength dependence of the scattered light.

Paper Details

Date Published: 20 February 2007
PDF: 8 pages
Proc. SPIE 6469, Optical Components and Materials IV, 646910 (20 February 2007); doi: 10.1117/12.699471
Show Author Affiliations
H. Murotani, Tokai Univ. (Japan)
T. Kudo, Tokai Univ. (Japan)
M. Wakaki, Tokai Univ. (Japan)

Published in SPIE Proceedings Vol. 6469:
Optical Components and Materials IV
Shibin Jiang; Michel J. F. Digonnet, Editor(s)

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