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Proceedings Paper

Differential gloss quality scale experiment update: an appearance-based image quality standard initiative (INCITS W1.1)
Author(s): Yee S. Ng; Chunghui Kuo; Eric Maggard; Dale Mashtare; Peter Morris; Susan Farnand
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Paper Abstract

Surface characteristics of a printed sample command a parallel group of visual attributes determining perceived image quality beyond color, and they manifest themselves through various perceived gloss features such as differential gloss, gloss granularity, gloss mottle, etc. Extending from the scope of ISO19799 with limited range of gloss level and printing technologies, the objective of this study is to derive an appearance-based differential gloss quality scale ranging from very low gloss level to very high gloss level composed by various printing technology/substrate combinations. Three psychophysical experiment procedures were proposed including the quality ruler method, pair comparison, and interval scaling with two anchor stimuli, where the pair comparison process was subsequently dropped because of the concern of experiment complexity and data consistency after preliminary trial study. In this paper, we will compare the obtained average quality scale after mapping to the sharpness quality ruler with the average perceived differential gloss via the interval scale. Our numerical analysis indicates a general inverse relationship between the perceived image quality and the gloss variation on an image.

Paper Details

Date Published: 29 January 2007
PDF: 8 pages
Proc. SPIE 6494, Image Quality and System Performance IV, 64940I (29 January 2007); doi: 10.1117/12.699139
Show Author Affiliations
Yee S. Ng, Eastman Kodak Co. (United States)
Chunghui Kuo, Eastman Kodak Co. (United States)
Eric Maggard, Hewlett Packard Co. (United States)
Dale Mashtare, Xerox Corp. (United States)
Peter Morris, Hewlett Packard Co. (United States)
Susan Farnand, Rochester Institute of Technology (United States)


Published in SPIE Proceedings Vol. 6494:
Image Quality and System Performance IV
Luke C. Cui; Yoichi Miyake, Editor(s)

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