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Proceedings Paper

Porous silicon 2D photonic crystals
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Paper Abstract

Porous silicon (PSi) is an attractive material for fabrication of multilayer optical devices such as Bragg reflectors, Fabry-Perot resonators and other novel (optical) components. Such devices are characterized by a periodic modulation of the refractive indices in alternating layers and can be classified as 1D photonic crystals. 2D photonic bandgap structures can be also obtained using a variation of applied potential on the back side of the sample during electrochemical formation of the multilayers. This technique allows a fabrication of spatially distributed filters on the millimeter size scale. In this paper, a new method is presented which uses a front side protective mask for the creation of 2D photonic bandgap structures on the micron scale. The devices obtained by this technique can be used for the creation of spatially distributed filters. The front side protective mask controls lateral undercut in multiple ways depending on the mask material. By varying the design and material of the protective mask, PSi interference filters with desired optical parameters across a field of view can be realized. In this paper, a novel, simple method to produce 2D periodic multilayer structures is described. In particular, the focus is on the changes in the photonic crystal cavities when various mask materials are used. In addition, a new type of active optical components for a chip-to chip interconnection based on the combination of our method and MEMS technology is presented.

Paper Details

Date Published: 6 February 2007
PDF: 8 pages
Proc. SPIE 6480, Photonic Crystal Materials and Devices VI, 64800T (6 February 2007); doi: 10.1117/12.699127
Show Author Affiliations
Natalya Tokranova, Univ. at Albany (United States)
Da Song, Univ. at Albany (United States)
Alison Gracias, Univ. at Albany (United States)
James Castracane, Univ. at Albany (United States)


Published in SPIE Proceedings Vol. 6480:
Photonic Crystal Materials and Devices VI
Ali Adibi; Shawn-Yu Lin; Axel Scherer, Editor(s)

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