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Proceedings Paper

Qualification of materials for applications in high fluence lasers
Author(s): James A. Pryatel; William H. Gourdin; George J. Hampton; Daniel M. Behne; Richard A. Meissner
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Paper Abstract

High power laser systems require nearly contamination free optics to maintain desired transport efficiency and to minimize optic damage. The required cleanliness is generally achieved through practices that preclude or remove foreign particle contamination. However, laser optic systems may also be contaminated by vapor-borne contaminants from material outgassing, by particles ablated from surfaces exposed to amplifier or laser light, or by contact with items used in the production and cleaning of optics and components. To minimize such contamination on the optics of the National Ignition Facility (NIF), a rigorous screening test program was introduced. This test program replicates conditions in the beam path as well as conditions during production and cleaning. The former is represented by sol-gel exposure tests and by subjecting materials to amplifier flashlamp light and 1ω laser light. The latter is represented by organic solvent extraction tests and surface contact tests for items that could contact optic surfaces. This paper will discuss the methodology for, and administration of, these tests and present results for selected materials.

Paper Details

Date Published: 15 January 2007
PDF: 11 pages
Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 640329 (15 January 2007); doi: 10.1117/12.697207
Show Author Affiliations
James A. Pryatel, LRL Energy Services (United States)
William H. Gourdin, Lawrence Livermore National Lab. (United States)
George J. Hampton, Lawrence Livermore National Lab. (United States)
Daniel M. Behne, Lawrence Livermore National Lab. (United States)
Richard A. Meissner, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 6403:
Laser-Induced Damage in Optical Materials: 2006
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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