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Proceedings Paper

Subpicosecond vacuum ultraviolet laser system for advanced materials processing
Author(s): Shoichi Kubodera; Yuta Taniguchi; Akira Hosotani; Masahito Katto; Atsushi Yokotani; Noriaki Miyanaga; Kunioki Mima
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Paper Abstract

We have been developing the vacuum ultraviolet (VUV) light sources and novel applications using such short wavelength emission sources. High quality amorphous Si thin films were successfully produced at room temperature as a result of photo-dissociation of SiH4 gas by using an Ar2* excimer lamp irradiation at 126 nm. To enhance such novel VUV processing applications, a compact VUV amplifier at 126 nm was developed by use of the optical-field-ionization (OFI) electrons. The gain-length product around 5 was obtained as a result of the optical feedback by using a VUV mirror. This amplifier was operated in a table-top size with a high repetition rate up to several kHz, which should be appropriate for any process applications. We also describe the schematic concept of the ultrashort pulse high-intensity VUV laser system at 126 nm with a pulse width of 100 fs.

Paper Details

Date Published: 14 February 2007
PDF: 8 pages
Proc. SPIE 6452, Laser Resonators and Beam Control IX, 645216 (14 February 2007); doi: 10.1117/12.697133
Show Author Affiliations
Shoichi Kubodera, Univ. of Miyazaki (Japan)
Yuta Taniguchi, Univ. of Miyazaki (Japan)
Akira Hosotani, Univ. of Miyazaki (Japan)
Masahito Katto, Univ. of Miyazaki (Japan)
Atsushi Yokotani, Univ. of Miyazaki (Japan)
Noriaki Miyanaga, Osaka Univ. (Japan)
Kunioki Mima, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 6452:
Laser Resonators and Beam Control IX
Alexis V. Kudryashov; Alan H. Paxton; Vladimir S. Ilchenko, Editor(s)

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