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Proceedings Paper

The silicon mold fabrication of a kind of micro-optical resonator and coupler
Author(s): Hui Ju; Takayuki Ohta; Satoru Takao; Masafumi Ito; Minoru Sasaki; Kazuhiro Hane; Masaru Hori
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Paper Abstract

We present the fabrication of a kind of hexagonal and triangular cavity mold, which can cast Polymethyl Methacrylate (PMMA) resonators and couplers. The mold is designed on (111) silicon wafer according to its crystal structure and anisotropic etching properties in the etchant of ethylene diamine, pyrocatechol, and water (EDP/EPW), forming sidewalls by six {110} crystal surfaces, which are perpendicular to the (111) plane and constitute precise hexagons and triangles. The RIE-ICP etching is used to define the depth of the triangle and hexagonal cavities, and the following EDP etching smoothes the sidewalls of cavities. Only high temperature EDP etching is proved to be able to get smooth sidewalls. Before etching, the wafer is aligned to the right crystal orientation by pre-etched marks. The etched results of different geometrical cavities are analyzed and discussed based on the crystal structure.

Paper Details

Date Published: 7 March 2007
PDF: 7 pages
Proc. SPIE 6462, Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII, 64620I (7 March 2007); doi: 10.1117/12.697130
Show Author Affiliations
Hui Ju, Wakayama Univ. (Japan)
Takayuki Ohta, Wakayama Univ. (Japan)
Satoru Takao, Wakayama Univ. (Japan)
Masafumi Ito, Wakayama Univ. (Japan)
Minoru Sasaki, Tohoku Univ. (Japan)
Kazuhiro Hane, Tohoku Univ. (Japan)
Masaru Hori, Nagoya Univ. (Japan)


Published in SPIE Proceedings Vol. 6462:
Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII
Mary-Ann Maher; Thomas J. Suleski; Eric G. Johnson; Harold D. Stewart; Jung-Chih Chiao; Gregory P. Nordin, Editor(s)

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