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Proceedings Paper

A mechanism for erosion of optics exposed to a laser-generated EUV plasma
Author(s): Jonathan W. Arenberg; Stuart McNaught; Mark Michaelian; Harry Shields; Dick Moyer; Steve Fornaca; Fernando Martos
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Paper Abstract

This paper introduces a theory for material erosion in proximity to a laser driven EUV source, with a xenon target. The mechanism hypothesized is x-ray induced damage. A semi empirical photo ablation model is developed using the laser induced damage threshold at 1.06 microns to set the critical energy density for material removal. The model also includes absorption of the plasma generated xrays and is shown to agree well with experiment. With the theory validated, the paper concludes with a calculation of a safe operating distance and how this distance could be calculated for other optic materials and plasma targets.

Paper Details

Date Published: 15 January 2007
PDF: 9 pages
Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 64030X (15 January 2007); doi: 10.1117/12.696422
Show Author Affiliations
Jonathan W. Arenberg, Northrop Grumman Space Technology (United States)
Stuart McNaught, Northrop Grumman Space Technology (United States)
Mark Michaelian, Northrop Grumman Space Technology (United States)
Harry Shields, Northrop Grumman Space Technology (United States)
Dick Moyer, Northrop Grumman Space Technology (United States)
Steve Fornaca, Northrop Grumman Space Technology (United States)
Fernando Martos, Northrop Grumman Space Technology (United States)


Published in SPIE Proceedings Vol. 6403:
Laser-Induced Damage in Optical Materials: 2006
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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