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Proceedings Paper

Is entanglement dispensable in quantum lithography?
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Paper Abstract

The working principle of quantum lithography has been demonstrated a few years ago: entangled N-photon systems can improve the spatial resolution of an imaging system by a factor of N, despite the classical Rayleigh limit. Recently, a number of experiments successfully simulated certain features of quantum imaging and two-photon interference-diffraction by using chaotic light in coincidence detection experiments. Can classical light simulate the effect of imaging type quantum lithography? This article attempts to provide an answer to this currently debated question.

Paper Details

Date Published: 30 August 2006
PDF: 10 pages
Proc. SPIE 6305, Quantum Communications and Quantum Imaging IV, 63050X (30 August 2006); doi: 10.1117/12.696336
Show Author Affiliations
Milena D'Angelo, Univ. of Maryland, Baltimore County (United States)
Giuliano Scarcelli, Univ. of Maryland, Baltimore County (United States)
Yanhua Shih, Univ. of Maryland, Baltimore County (United States)


Published in SPIE Proceedings Vol. 6305:
Quantum Communications and Quantum Imaging IV
Ronald E. Meyers; Yanhua Shih; Keith S. Deacon, Editor(s)

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