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Laser resistivity of selected multilayer designs for DUV/VUV applicationsFormat | Member Price | Non-Member Price |
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Paper Abstract
Standard DUV mirror systems with conventional quarterwave design were deposited from oxide materials by ion beam
sputtering deposition (IBS) and from fluoride materials by conventional thermal evaporation for the wavelength
193 nm. In addition, a protected fluoride mirror system was manufactured consisting of a conventional fluoride stack
with a dense SiO2 protection layer. In a comparative study, these mirror systems were characterised in respect to their
optical properties and absorption in the VUV spectral range. Subsequently, the value of the laser-induced damage
threshold (LIDT) of the mirrors was determined in an S-on-1 procedure. All DUV measurements were conducted under
the conditions of nitrogen purging. It was observed that all mirror system exhibit a similar optical performance and loss
levels at 193 nm. However, it was found for the LIDT value, that for IBS oxide system the damage mechanism is defect
induced at a comparable low level, whereas the LIDT value of evaporated fluoride mirror is absorption induced, with
1-on-1 values of up to 6 J/cm2. The protected fluoride mirror exhibits value in the intermediate range.
Paper Details
Date Published: 15 January 2007
PDF: 8 pages
Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 640318 (15 January 2007); doi: 10.1117/12.696241
Published in SPIE Proceedings Vol. 6403:
Laser-Induced Damage in Optical Materials: 2006
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)
PDF: 8 pages
Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 640318 (15 January 2007); doi: 10.1117/12.696241
Show Author Affiliations
D. Ristau, Laser Zentrum Hannover (Germany)
Published in SPIE Proceedings Vol. 6403:
Laser-Induced Damage in Optical Materials: 2006
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)
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