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Proceedings Paper

Mitigation of growth of laser initiated surface damage in fused silica using a 4.6-um wavelength laser
Author(s): Gabe Guss; Isaac Bass; Vaughn Draggoo; Richard Hackel; Steve Payne; Mark Lancaster; Paul Mak
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Paper Abstract

Surface damage caused by high fluence, 351 nm light to fused silica optics can adversely affect the performance of fusion class laser systems like that of the National Ignition Facility (NIF). It is typically initiated as a small pit and grows in both diameter and depth during normal operation with cracks that extend into the bulk. Mitigation of this growth has been previously reported using a 10.6 micron CO2 laser. Here, we report growth mitigation with the 4.6 micron light from a frequency-doubled, 9.2 micron CO2 laser. The motivation for using 4.6 microns is >25 times longer absorption length in fused silica at room temperature compared to that at 10.6 micron. Mitigation of subsurface cracks at 10.6 micron required ablation of material to the depth of the cracks. In contrast, it was possible to mitigate the subsurface cracks using 4.6 micron light without significant ablation of material. Damage sites as large as 500 microns in diameter with cracks extending to 200 microns in depth were successfully mitigated with 4.6 microns.

Paper Details

Date Published: 15 January 2007
PDF: 12 pages
Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 64030M (15 January 2007); doi: 10.1117/12.696084
Show Author Affiliations
Gabe Guss, Lawrence Livermore National Lab. (United States)
Isaac Bass, Lawrence Livermore National Lab. (United States)
Vaughn Draggoo, Lawrence Livermore National Lab. (United States)
Richard Hackel, Lawrence Livermore National Lab. (United States)
Steve Payne, Lawrence Livermore National Lab. (United States)
Mark Lancaster, Naval Research Lab. (United States)
Paul Mak, Naval Research Lab. (United States)

Published in SPIE Proceedings Vol. 6403:
Laser-Induced Damage in Optical Materials: 2006
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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