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Proceedings Paper

Three-dimensional deposition of silicon from silicate glass with dispersed metallic aluminum by a femtosecond laser
Author(s): K. Miura; Y. Shimotsuma; M. Sakakura; S. Kanehira; M. Hamabe; K. Hirao
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Paper Abstract

We have fabricated silicon structure in silicate glass prepared with metallic aluminum in the starting material, using femtosecond laser irradiation and subsequent annealing. Small Si-rich structures such as oxygen-deficiency (O-deficiency) defects or Si clusters transform into nano-sized Si particles by the focusing irradiation of the laser. Then the Si-rich structures grow into micro-size particles due to the thermite reaction promoted by heat treatment. We determine the effect of focused laser pulse on the Si deposition process by using a time-resolved transient lens method with a sub-picosecond laser pulse. Localized high-temperature, high-pressure, and the generation of shock waves appear to be very important in forming the Si-rich structures that ultimately grow into Si particles. The diffusion of oxygen by shock waves and the existence of Al-rich structures help form Si-rich structures as Si-O bonds continuously break under high temperature. The focusing irradiation of femtosecond lasers is very useful for fabricating Si structures inside glass.

Paper Details

Date Published: 22 December 2006
PDF: 13 pages
Proc. SPIE 6413, Smart Materials IV, 64130K (22 December 2006); doi: 10.1117/12.695925
Show Author Affiliations
K. Miura, Kyoto Univ. (Japan)
Y. Shimotsuma, Kyoto Univ. (Japan)
M. Sakakura, Kyoto Univ. (Japan)
S. Kanehira, Kyoto Univ. (Japan)
M. Hamabe, Kyoto Univ. (Japan)
K. Hirao, Kyoto Univ. (Japan)

Published in SPIE Proceedings Vol. 6413:
Smart Materials IV
Nicolas H. Voelcker, Editor(s)

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