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Proceedings Paper

Development of nanostructured titanium oxide thin films using a gas carving technique
Author(s): Deepak Dhawan; Ylias Sabri; Suresh Bhargava; Dinesh Sood; K. Kalantar-Zadeh
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Paper Abstract

A method is developed for producing nano-structured titanium oxide thin films using H2 gas interaction with titanium thin film at a high temperature. These nano-structured thin films have been formed on a quartz crystal substrate. Titanium (Ti) thin films were deposited on the quartz crystal using a RF magnetron sputterer. The samples were placed in the oven at 500-800°C for 5 hours. The gas mixture of 1% H2 in N2 was introduced in the oven. The process of Ti annealing in the presence of H2 carves Ti films into nano-structure shapes. The process is a gas-solid interaction. Thin films were characterised using Scanning Electron Microscopes (SEM) and X-Ray Diffraction (XRD) technique. The nano structures formed have dimensions in a range of 25nm - 150nm obtained after gas carving.

Paper Details

Date Published: 20 December 2006
PDF: 8 pages
Proc. SPIE 6415, Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems III, 641514 (20 December 2006); doi: 10.1117/12.695539
Show Author Affiliations
Deepak Dhawan, RMIT Univ. (Australia)
Ylias Sabri, RMIT Univ./City Campus (Australia)
Suresh Bhargava, RMIT Univ./City Campus (Australia)
Dinesh Sood, RMIT Univ. (Australia)
K. Kalantar-Zadeh, RMIT Univ. (Australia)


Published in SPIE Proceedings Vol. 6415:
Micro- and Nanotechnology: Materials, Processes, Packaging, and Systems III
Jung-Chih Chiao; Andrew S. Dzurak; Chennupati Jagadish; David Victor Thiel, Editor(s)

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