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Proceedings Paper

Surface particulate contamination of the LIL optical components and their evolution under laser irradiation
Author(s): S. Palmier; S. Garcia; L. Lamaignère; M. Loiseau; T. Donval; J. L. Rullier; I. Tovena; L. Servant
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Paper Abstract

To evaluate the impact of particulate contamination in laser induced damage of optical material, an experimental program is established. The first step consists in the Ligne d'Integration Laser (LIL) particle contamination sampling. Carbonated cellophane tapes, antireflection coated and uncoated silica samples were inserted in the LIL laser chain, in six different zones to collect particles. The second step is the pollution characterization. Polluted cellophane tapes are analysed by Scanning Electron Microscopy and Energy Dispersive Spectrometry. The density and the nature of particles collected in the Amplification Section are found to be homogenous throughout this section. The pollution collected in the Frequency Conversion and Focusing system is more complex. One of its features is a larger proportion of silica particles. The last step consists in the silica samples irradiation. Antireflection coated and uncoated silica samples are examined by optical microscopy, then irradiated at 1064 nm or 355 nm and examined again. No damage growing under several irradiations is observed. We show a cleaning effect efficient for particles larger than 20 microns.

Paper Details

Date Published: 18 January 2007
PDF: 10 pages
Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 64030V (18 January 2007); doi: 10.1117/12.695442
Show Author Affiliations
S. Palmier, CEA/CESTA (France)
S. Garcia, CEA/CESTA (France)
L. Lamaignère, CEA/CESTA (France)
M. Loiseau, CEA/CESTA (France)
T. Donval, CEA/CESTA (France)
J. L. Rullier, CEA/CESTA (France)
I. Tovena, CEA/CESTA (France)
L. Servant, Lab. de Physico Chimie Moléculaire, Univ. de Bordeaux I (France)

Published in SPIE Proceedings Vol. 6403:
Laser-Induced Damage in Optical Materials: 2006
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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