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Proceedings Paper

Evaluation of cleaning methods for multilayer diffraction gratings
Author(s): B. Ashe; K. L. Marshall; C. Giacofei; A. L. Rigatti; T. J. Kessler; A. W. Schmid; J. B. Oliver; J. Keck; A. Kozlov
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Paper Abstract

Multilayer dielectric (MLD) diffraction gratings are an essential component for the OMEGA EP short-pulse, highenergy laser system. The MLD gratings must have both high-optical-diffraction efficiency and high laser-damage threshold to be suitable for use within the OMEGA EP Laser System. Considerable effort has been directed toward optimizing the process parameters required to fabricate gratings that can withstand the 2.6-kJ output energy delivered by each beam. In this paper, we discuss a number of conventional semiconductor chemical cleaning processes that have been investigated for grating cleaning, and present evidence of their effectiveness in the critical cleaning of MLD gratings fabricated at LLE. Diffraction efficiency and damage-threshold data were correlated with both scanning electron microscopy (SEM) and time-of-flight secondary ion-mass spectrometry (ToF-SIMS) to determine the best combination of cleaning process and chemistry. We found that using these cleaning processes we were able to exceed both the LLE diffraction efficiency (specification >97%) and laser-damage specifications (specification >2.7 J/cm2).

Paper Details

Date Published: 15 January 2007
PDF: 9 pages
Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 64030O (15 January 2007); doi: 10.1117/12.694884
Show Author Affiliations
B. Ashe, Univ. of Rochester (United States)
K. L. Marshall, Univ. of Rochester (United States)
C. Giacofei, Univ. of Rochester (United States)
A. L. Rigatti, Univ. of Rochester (United States)
T. J. Kessler, Univ. of Rochester (United States)
A. W. Schmid, Univ. of Rochester (United States)
J. B. Oliver, Univ. of Rochester (United States)
J. Keck, Univ. of Rochester (United States)
A. Kozlov, Univ. of Rochester (United States)

Published in SPIE Proceedings Vol. 6403:
Laser-Induced Damage in Optical Materials: 2006
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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