Share Email Print
cover

Proceedings Paper

Damages to optical silica glass: processes and mechanisms
Author(s): Sheng-Nian Luo; Lianqing Zheng; Qi An; Heng-An Wu; Kaiwen Xia; Sidao Ni
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We present recent results of molecular dynamics simulations to illustrate the processes and mechanisms in damages to silica glass, including densification, cavitation, fragmentation and agglomeration via photon, electron, ion and neutron radiations and stresses. Radiation of glass creates point defects (vacancies and interstitials), and subsequent structure relaxation induces densification. Nanovoid below a certain size and rapid-quenching of silica liquid can also densify a glass. Hot spots due to photon-absorbing impurities in glass may cause local densification and cavitation as well. Densification can also be induced by compressional stress, and spall, by tensile stress. The densified glasses, regardless of the exact processes, share similar structural and vibrational properties, for example, the five-fold coordinated Si atoms. Densification is essentially a kinetic frustration during structure relaxation driven by excessive free energy, e.g., due to defects or stresses. The point-defect mechanism is dominant for densification without compression and complemented by thermal spike mechanism in thermal processes. Defects, thermal effects and stresses may interplay in a general damage process in silica glass.

Paper Details

Date Published: 15 January 2007
PDF: 10 pages
Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 64030C (15 January 2007); doi: 10.1117/12.694797
Show Author Affiliations
Sheng-Nian Luo, Los Alamos National Lab. (United States)
Lianqing Zheng, Univ. of Missouri, Columbia (United States)
Qi An, Univ. of Science and Technology of China (China)
Heng-An Wu, Univ. of Science and Technology of China (China)
Kaiwen Xia, Univ. of Toronto (Canada)
Sidao Ni, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 6403:
Laser-Induced Damage in Optical Materials: 2006
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

© SPIE. Terms of Use
Back to Top