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Proceedings Paper

The mechanism of ionization radiation-induced compaction in fused silica
Author(s): Fan Piao; William G. Oldham
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Paper Abstract

A number of fused silica samples were evaluated for their resistance to densification by deep ultraviolet (UV) radiation at 193nm wavelength. Density changes for all the samples equal the product of a material dependent constant and the absorbed two-photon dose to a sub-linear power of about 2/3. This dose dependence is consistent with earlier compaction studies using UV, electron and gamma radiation. We propose a fictive temperature model to describe fused silica structure; and the observed stretched power dependence of compaction on deposited energy for ionization damage can be explained by a simple network relaxation process. Experimental observations of isothermal-annealing behavior of UV-induced compaction in fused silica agree very well with our theoretical prediction; e.g. strong correlation between thermal recovery of compaction and the compaction rates for different fused silica samples; preheat-treatment can manipulate the compaction damage rates.

Paper Details

Date Published: 15 January 2007
PDF: 14 pages
Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 640320 (15 January 2007); doi: 10.1117/12.694507
Show Author Affiliations
Fan Piao, KLA-Tencor Corp. (United States)
William G. Oldham, Univ. of California, Berkeley (United States)


Published in SPIE Proceedings Vol. 6403:
Laser-Induced Damage in Optical Materials: 2006
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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