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Proceedings Paper

Inverse lithography technology at low k1: placement and accuracy of assist features
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Paper Abstract

An implementation of inverse lithography technology is studied with special attention to illustrating and analyzing the placement, accuracy, and efficacy of subresolution assist elements. One-dimensional placement through pitch is characterized, and 2D capability is demonstrated for repeated patterns. Differences between the methods of mask preparation afforded by this system as compared to current practices are described.

Paper Details

Date Published: 20 October 2006
PDF: 11 pages
Proc. SPIE 6349, Photomask Technology 2006, 63494T (20 October 2006); doi: 10.1117/12.693039
Show Author Affiliations
Andrew Moore, Luminescent Technologies, Inc. (United States)
Timothy Lin, Luminescent Technologies, Inc. (United States)
Yong Liu, Luminescent Technologies, Inc. (United States)
Gordon Russell, Luminescent Technologies, Inc. (United States)
Linyong Pang, Luminescent Technologies, Inc. (United States)
Daniel Abrams, Luminescent Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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