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Proceedings Paper

Advanced non-disruptive manufacturing rule checks (MRC)
Author(s): Bill Moore; Tanya Do; Ray E. Morgan
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Paper Abstract

New advanced mask rule checking (MRC) solutions are required to ensure cost effective, high yield photomask manufacturing processes at 65nm and below and are needed to provide new verification capabilities for mask makers and data prep engineers alike. Traditional MRC, which implements fundamental geometric data checks on limited data formats, is not sufficient for advanced photomask manufacturing. Like recent advances in design rule checking (DRC) software, which includes extensive "manufacturing-aware" rules (or DFM rules), MRC solutions must evolve to include a more comprehensive and intelligent rule checks for the mask manufacturing process. This paper describes the development and testing of an advanced MRC software solution developed within the CATSTM mask data preparation (MDP) solution from Synopsys Inc. The new MRC solution enables the inspection and analysis of mask layout patterns for simple and advanced data verification checks. Proposed applications for mask data prep applications are discussed and include incoming design verification, fracture data correction, inspection tool data tags, mask manufacturing tool or inspection tool selection, and job deck verification.

Paper Details

Date Published: 20 October 2006
PDF: 10 pages
Proc. SPIE 6349, Photomask Technology 2006, 634915 (20 October 2006); doi: 10.1117/12.692945
Show Author Affiliations
Bill Moore, Synopsys Inc. (United States)
Tanya Do, Synopsys Inc. (United States)
Ray E. Morgan, Synopsys Inc. (United States)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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