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Proceedings Paper

Real-time ultra-sensitive ambient ammonia monitor for advanced lithography
Author(s): Eric Crosson; Katsumi Nishimura; Yuhei Sakaguchi; Chris W. Rella; Edward Wahl
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Paper Abstract

In the semiconductor industry, control of ammonia at the parts-per-billion concentration level is critical to insure the integrity of the lithography process. Ammonia is emitted into wafer fab air by various semiconductor processes including CVD, wafer cleaning, coater tracks, and CMP, as well as from outdoor air. Exposure to even low parts-per-billion concentrations of ammonia during the photolithography process can lead to yield loss and unscheduled equipment downtime. Picarro, Inc. has developed a field-deployable, real time, ambient gas analyzer capable of continuously monitoring parts-per-trillion levels of ammonia in situ, and in real-time, thereby allowing a user to directly monitor ammonia levels in sensitive photo-lithography equipment.

Paper Details

Date Published: 20 October 2006
PDF: 11 pages
Proc. SPIE 6349, Photomask Technology 2006, 63492R (20 October 2006); doi: 10.1117/12.692934
Show Author Affiliations
Eric Crosson, Picarro, Inc. (United States)
Katsumi Nishimura, Horiba, Ltd. (Japan)
Yuhei Sakaguchi, Horiba, Ltd. (Japan)
Chris W. Rella, Picarro, Inc. (United States)
Edward Wahl, Picarro, Inc. (United States)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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