Share Email Print

Proceedings Paper

NIL template making and imprint evaluation
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Nano-imprint lithography (NIL) is expected as one of the candidates for hp32nm to hp22nm technology nodes. NIL needs 1X patterns on masks and a transit from 4X to 1X means a big and hard technology jump for the mask industry. We have reported in previous papers that the resolution limit with 50keV acceleration voltage VSB (variable shaped beam) electron beam writer, which are used in current 4X photomask manufacturing, was around 65nm. And we have also reported that to reach the required resolution for hp32nm node, the usage of a 100keV acceleration voltage spot beam writer would be inevitable. Recently, we have installed a 100keV spot beam EB writer adjacent to our photomask manufacturing line. In this paper, we will present our initial results with the tool. We have confirmed, after tuning of our process, a stable resolution capability compatible for hp32nm. With this process, we have begun sample template manufacturing, and initial imprint results are also presented. Templates with hp28nm dense line patterns were fabricated and were well imprinted.

Paper Details

Date Published: 20 October 2006
PDF: 8 pages
Proc. SPIE 6349, Photomask Technology 2006, 63492C (20 October 2006); doi: 10.1117/12.692886
Show Author Affiliations
Yuuichi Yoshida, Dai Nippon Printing Co., Ltd. (Japan)
Ayumi Kobiki, Dai Nippon Printing Co., Ltd. (Japan)
Takaaki Hiraka, Dai Nippon Printing Co., Ltd. (Japan)
Satoshi Yusa, Dai Nippon Printing Co., Ltd. (Japan)
Shiho Sasaki, Dai Nippon Printing Co., Ltd. (Japan)
Kimio Itoh, Dai Nippon Printing Co., Ltd. (Japan)
Nobuhito Toyama, Dai Nippon Printing Co., Ltd. (Japan)
Masaaki Kurihara, Dai Nippon Printing Co., Ltd. (Japan)
Hiroshi Mohri, Dai Nippon Printing Co., Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

© SPIE. Terms of Use
Back to Top