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Proceedings Paper

Reparing the mask industry
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Paper Abstract

In many semiconductor markets, the largest fraction of total lithography cost is photomask cost; therefore any improvements in that area can have a noticeable impact on net chip cost. A significant yield loss mechanism for advanced photomasks is through nonrepairable defects. Providing improved methods to repair defects allows for improvements in mask yield and, therefore, the cost to make a defect-free mask and eventually the cost to produce the integrated circuit. However, the connection between mask yield and integrated circuit price is not a first-order relationship because it bridges between the mask supplier and end-user. SEMATECH and other worldwide consortia have, in the past, bridged this gap by sponsoring programs to develop improved mask infrastructure tools. A significant investment has been made in mask repair tool technology, but the quantitative benefit and return on investment has not been summarized until now. This paper attempts to show the strong benefits to the photomask and semiconductor industries from improving mask repair.

Paper Details

Date Published: 20 October 2006
PDF: 8 pages
Proc. SPIE 6349, Photomask Technology 2006, 634929 (20 October 2006); doi: 10.1117/12.692826
Show Author Affiliations
Michael Lercel, Sematech (United States)
IBM (United States)
Scott Hector, Freescale Semiconductor, Inc. (United States)

Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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