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Proceedings Paper

A novel Alt-PSM structure: isn't this an embedded Atten-PSM?
Author(s): S. Nakao; K. Hosono; S. Maejima; K. Narimatsu; T. Hanawa; K. Suko
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Paper Abstract

A novel mask structure for an alternating aperture phase shift mask (Alt-PSM) to cut mask cost is proposed. By a mask with structure of an embedded attenuating phase shift mask (Atten-PSM), an Alt-PSM for an isolated line formation can be well fabricated. Fine image quality is confirmed with optical image calculations. Moreover, concept of this novel mask is proved by a preliminary experiment. In conclusion, this novel mask can replace conventional Alt-PSM for logic devices, resulting in considerable cut of mask cost.

Paper Details

Date Published: 20 October 2006
PDF: 8 pages
Proc. SPIE 6349, Photomask Technology 2006, 63492Q (20 October 2006); doi: 10.1117/12.692820
Show Author Affiliations
S. Nakao, Renesas Technology Corp. (Japan)
K. Hosono, Renesas Technology Corp. (Japan)
S. Maejima, Renesas Technology Corp. (Japan)
K. Narimatsu, Renesas Technology Corp. (Japan)
T. Hanawa, Renesas Technology Corp. (Japan)
K. Suko, Renesas Technology Corp. (Japan)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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