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Proceedings Paper

Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics
Author(s): Yoshitake Tsuji; Nobutaka Kikuiri; Shingo Murakami; Kenichi Takahara; Ikunao Isomura; Yukio Tamura; Kyoji Yamashita; Ryoichi Hirano; Motonari Tateno; Kenichi Matsumura; Naohisa Takayama; Kinya Usuda
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Paper Abstract

We have developed a mask inspection system using 199nm inspection light wavelength. This system performs transmission and reflection inspection processes concurrently within two hours per plate. By the evaluation result of mask images and inspection sensitivity, it is confirmed that the 199nm inspection system has the advantage over the system using 257nm and has the possibility corresponding to next generation mask inspection. Furthermore, advanced die-to-database (D-DB) inspection, which can generate high-fidelity of a reference image based on the CAD data for alternating phase shift mask (PSM) or tri-tone, is required for next generation inspection system, too. Therefore, a reference image generation method using two-layer CAD data has been developed. In this paper, the effectiveness of this method is described.

Paper Details

Date Published: 20 October 2006
PDF: 8 pages
Proc. SPIE 6349, Photomask Technology 2006, 63493M (20 October 2006); doi: 10.1117/12.692811
Show Author Affiliations
Yoshitake Tsuji, Advanced Mask Inspection Technology, Inc. (Japan)
Nobutaka Kikuiri, Advanced Mask Inspection Technology, Inc. (Japan)
Shingo Murakami, Advanced Mask Inspection Technology, Inc. (Japan)
Kenichi Takahara, Advanced Mask Inspection Technology, Inc. (Japan)
Ikunao Isomura, Advanced Mask Inspection Technology, Inc. (Japan)
Yukio Tamura, Advanced Mask Inspection Technology, Inc. (Japan)
Kyoji Yamashita, Advanced Mask Inspection Technology, Inc. (Japan)
Ryoichi Hirano, Advanced Mask Inspection Technology, Inc. (Japan)
Motonari Tateno, Advanced Mask Inspection Technology, Inc. (Japan)
Kenichi Matsumura, Advanced Mask Inspection Technology, Inc. (Japan)
Naohisa Takayama, Advanced Mask Inspection Technology, Inc. (Japan)
Kinya Usuda, Advanced Mask Inspection Technology, Inc. (Japan)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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