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Proceedings Paper

Impact of light polarisation on UV stabilisation of embossed patterns
Author(s): Matthias Wissen; Nicolas Bogdanski; Hella-Christin Scheer
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Proc. SPIE 6281, 22nd European Mask and Lithography Conference, ; doi: 10.1117/12.692739
Show Author Affiliations
Matthias Wissen, Bergische Univ.-Gesamthochschule Wuppertal (Germany)
Nicolas Bogdanski, Bergische Univ.-Gesamthochschule Wuppertal (Germany)
Hella-Christin Scheer, Bergische Univ.-Gesamthochschule Wuppertal (Germany)


Published in SPIE Proceedings Vol. 6281:
22nd European Mask and Lithography Conference

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