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Proceedings Paper

Calibration of test masks used for lithography lens systems
Author(s): M. Arnz; W. Häβler-Grohne; B. Bodermann; H. Bosse
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Paper Abstract

We report on the calibration approach and results as well as the application of special test masks for the qualification process of projection lens systems for advanced wafer steppers and scanners. We concentrate here on two different sets of test masks. One test mask set was designed for aerial image based contrast metrology while the other set of qualification masks was applied to provide an absolute reference for the magnification of the lens system. On the contrast test masks we measured variations of CD ratios of about 10% for differently oriented structures. Additionally we compared the lithography lens magnification obtained by using both grating test masks calibrated by the PTB with a pitch ratio uncertainty of 5 x 10-7 with that obtained by employing alternative external scale calibration standards.

Paper Details

Date Published: 21 June 2006
PDF: 12 pages
Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810C (21 June 2006); doi: 10.1117/12.692735
Show Author Affiliations
M. Arnz, Carl Zeiss SMT AG (Germany)
W. Häβler-Grohne, Physikalisch-Technische Bundesanstalt (Germany)
B. Bodermann, Physikalisch-Technische Bundesanstalt (Germany)
H. Bosse, Physikalisch-Technische Bundesanstalt (Germany)


Published in SPIE Proceedings Vol. 6281:
22nd European Mask and Lithography Conference

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