Share Email Print

Proceedings Paper

Challenges of the photomask supply chain for 65 nm technologies
Author(s): Andreas Torsy; Ingo Höllein; Michel Tissier; Markus Bender; Olaf Filies; Carsten Fülber
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Details

Date Published:
Proc. SPIE 6281, 22nd European Mask and Lithography Conference, ; doi: 10.1117/12.692694
Show Author Affiliations
Andreas Torsy, ALTIS Semiconductor (France)
Ingo Höllein, Advanced Mask Technology Ctr. (Germany)
Michel Tissier, Toppan Photomasks, Inc. (France)
Markus Bender, Infineon Technologies AG (Germany)
Olaf Filies, Infineon Technologies AG (Germany)
Carsten Fülber, Infineon Technologies Dresden (Germany)

Published in SPIE Proceedings Vol. 6281:
22nd European Mask and Lithography Conference

© SPIE. Terms of Use
Back to Top