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Proceedings Paper

Nanoimprint lithography techniques: an introduction
Author(s): H.-C. Scheer
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Paper Abstract

The main nanoimprint lithography techniques are highlighted in this paper. In addition to details concerning the materials used and the basic processing techniques, some of the major recent developments are summarized. Critical issues are addressed and some ideas for improvement are given. The paper aims to give an introduction to the techniques and a survey of the actual status without going into the details of the specific techniques.

Paper Details

Date Published: 21 June 2006
PDF: 10 pages
Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810N (21 June 2006); doi: 10.1117/12.692648
Show Author Affiliations
H.-C. Scheer, Univ. of Wuppertal (Germany)

Published in SPIE Proceedings Vol. 6281:
22nd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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