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Proceedings Paper

Recent application results from the novel e-beam-based mask repair system MeRiT MG
Author(s): Christian Ehrlich; Klaus Edinger; Thorsten Hofmann; Wolfgang Degel
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Paper Abstract

With the continuing decrease of feature sizes in conjunction with both the enormous costs for current masks and projections for future generations the area of mask repair has often been highlighted. Clearly, a viable repair methodology going forward has the potential to significantly influence and reduce production costs for the complete mask set. Carl Zeiss SMS had, in a concerted development effort with other Zeiss daughter companies, succeeded to develop and deploy a novel mask repair tool capable of repairing specifically all types of advanced masks, such as quartz binary masks, phase shift masks, EUV masks and S-FIL imprint templates. In addition to the pure technical capability of the e-beam based approach a strong emphasis has been made towards the user friendliness and automation features of the repair process as such.

Paper Details

Date Published: 21 June 2006
PDF: 8 pages
Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810M (21 June 2006); doi: 10.1117/12.692647
Show Author Affiliations
Christian Ehrlich, Carl Zeiss SMS GmbH (Germany)
Klaus Edinger, NaWoTec GmbH (Germany)
Thorsten Hofmann, NaWoTec GmbH (Germany)
Wolfgang Degel, Carl Zeiss SMS GmbH (Germany)


Published in SPIE Proceedings Vol. 6281:
22nd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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