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Proceedings Paper

ORC and LfD as first steps towards DfM
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Paper Abstract

The role the Optical Rule Check (ORC) in the design flow and future directions are discussed, the benefit of the model-based methodology is illustrated by using realistic layout situations. Concepts for implementation of Litho-friendly Design (LfD), i.e., of layout optimization and lithography simulations in the pre-tapeout design flow are developed.

Paper Details

Date Published: 21 June 2006
PDF: 6 pages
Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810I (21 June 2006); doi: 10.1117/12.692641
Show Author Affiliations
Reinhard März, Infineon Technologies AG (Germany)
Kai Peter, Infineon Technologies AG (Germany)
Wilhelm Maurer, Infineon Technologies AG (Germany)

Published in SPIE Proceedings Vol. 6281:
22nd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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